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1 Ergebnisse
1
Atmospheric HF vapor based silicon etching with Pt catalyst..:
, In:
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
,
Hwang, Sunghyun
;
Carr, William N.
;
Yoon, Yong-Kyu
- p. 898-902 , 2022
Link:
https://doi.org/10.1109/ECTC51906.2022.00146
RT T1
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
: T1
Atmospheric HF vapor based silicon etching with Pt catalyst for high fidelity through silicon via (TSV) fabrication
UL https://suche.suub.uni-bremen.de/peid=ieee-9816464&Exemplar=1&LAN=DE A1 Hwang, Sunghyun A1 Carr, William N. A1 Yoon, Yong-Kyu YR 2022 SN 2377-5726 K1 Fabrication K1 Costs K1 Metals K1 Atmosphere K1 Bandwidth K1 Etching K1 Silicon K1 high fidelity through silicon vias K1 vapor based metal assisted chemical etching K1 dry mode metal assistaed chemical etching (d-MaCE) K1 high frequency application SP 898 OP 902 LK http://dx.doi.org/https://doi.org/10.1109/ECTC51906.2022.00146 DO https://doi.org/10.1109/ECTC51906.2022.00146 SF ELIB - SuUB Bremen
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