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1 Ergebnisse
1
Lithography:
, In:
2021 IEEE International Roadmap for Devices and Systems Outbriefs
,
Neisser, Mark
;
Levinson, Harry J.
;
Wurm, Stefan
... - p. 1-11 , 2021
Link:
https://doi.org/10.1109/IRDS54852.2021.00017
RT T1 <cTitle>2021 IEEE International Roadmap for Devices and Systems Outbriefs</cTitle>: T1 <Title>Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9827532&Exemplar=1&LAN=DE A1 Neisser, Mark A1 Levinson, Harry J. A1 Wurm, Stefan A1 Kyser, David A1 Watanabe, Takeo A1 Macwilliams, Ken A1 Ishiuchi, Hidemi A1 Trybula, Walt A1 Hayashi, Naoya A1 Fedynyshyn, Ted A1 Higgins, Craig A1 Nakamura, Tsuyoshi A1 Resnick, Doug A1 Preil, Moshe A1 Lercel, Michael A1 Aoyama, Hajime A1 Hosler, Erik YR 2021 K1 Industries K1 Lithography K1 Electronics industry K1 IRDS K1 Roadmap K1 Patterning SP 1 OP 11 LK http://dx.doi.org/https://doi.org/10.1109/IRDS54852.2021.00017 DO https://doi.org/10.1109/IRDS54852.2021.00017 SF ELIB - SuUB Bremen
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