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1 Ergebnisse
1
A 3nm GAAFET Analog Assisted Digital LDO with High Current ..:
, In:
2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)
,
Kim, Seki
;
Lee, Hyongmin
;
Lee, Yongjin
... - p. 190-191 , 2022
Link:
https://doi.org/10.1109/VLSITechnologyandCir46769.2022..
RT T1 <cTitle>2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)</cTitle>: T1 <Title>A 3nm GAAFET Analog Assisted Digital LDO with High Current Density for Dynamic Voltage Scaling Mobile Applications</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9830252&Exemplar=1&LAN=DE A1 Kim, Seki A1 Lee, Hyongmin A1 Lee, Yongjin A1 Lee, Dongha A1 Lee, Byeongbae A1 Jin, Jahoon A1 Kim, Susie A1 Noh, Miri A1 Kang, Kwonwoo A1 Kim, Sangho A1 Nomiyama, Takahiro A1 Paek, Ji-Seon A1 Lee, Jongwoo YR 2022 SN 2158-9682 K1 Very large scale integration K1 CMOS technology K1 Dynamic voltage scaling K1 Mobile applications K1 Current density K1 Transient analysis K1 Digital LDO K1 hybrid LDO K1 analog assisted digital LDO K1 DLDO SP 190 OP 191 LK http://dx.doi.org/https://doi.org/10.1109/VLSITechnologyandCir46769.2022.9830252 DO https://doi.org/10.1109/VLSITechnologyandCir46769.2022.9830252 SF ELIB - SuUB Bremen
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