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1 Ergebnisse
1
Searching Optimal Growth Parameters for HfO₂ Applied by Pla..:
, In:
2022 IEEE 23rd International Conference of Young Professionals in Electron Devices and Materials (EDM)
,
Krasnova, Irina A.
;
Gorshkov, Dmitry V.
;
Zakirov, Evgeny R.
.. - p. 75-78 , 2022
Link:
https://doi.org/10.1109/EDM55285.2022.9855104
RT T1
2022 IEEE 23rd International Conference of Young Professionals in Electron Devices and Materials (EDM)
: T1
Searching Optimal Growth Parameters for HfO₂ Applied by Plasma-Enhanced Atomic Layer Deposition Method
UL https://suche.suub.uni-bremen.de/peid=ieee-9855104&Exemplar=1&LAN=DE A1 Krasnova, Irina A. A1 Gorshkov, Dmitry V. A1 Zakirov, Evgeny R. A1 Sidorov, Georgiy Yu. A1 Sabinina, Irina V. YR 2022 SN 2325-419X K1 Temperature measurement K1 Temperature dependence K1 Temperature K1 Dielectric constant K1 Density measurement K1 Films K1 Atomic layer deposition K1 HfO₂ K1 plasma-enhanced atomic layer deposition K1 PE-ALD K1 XPS K1 CV characteristics SP 75 OP 78 LK http://dx.doi.org/https://doi.org/10.1109/EDM55285.2022.9855104 DO https://doi.org/10.1109/EDM55285.2022.9855104 SF ELIB - SuUB Bremen
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