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1 Ergebnisse
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A Study on the Hf0.5Zr0.5O2 Ferroelectric Capacitors fabric..:
, In:
2022 China Semiconductor Technology International Conference (CSTIC)
,
Kim, Yujin
;
Liu, Zhan
;
Jiang, Hao
... - p. 1-3 , 2022
Link:
https://doi.org/10.1109/CSTIC55103.2022.9856746
RT T1 <cTitle>2022 China Semiconductor Technology International Conference (CSTIC)</cTitle>: T1 <Title>A Study on the Hf0.5Zr0.5O2 Ferroelectric Capacitors fabricated with Hf and Zr Chlorides</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9856746&Exemplar=1&LAN=DE A1 Kim, Yujin A1 Liu, Zhan A1 Jiang, Hao A1 Ma, T.P. A1 Zheng, Jun-Fei A1 Chen, Phil A1 Condo, Eric A1 Hendrix, Bryan A1 O'Neill, James A. YR 2022 K1 Temperature measurement K1 Semiconductor device measurement K1 Zirconium K1 Ferroelectric films K1 Films K1 Capacitors K1 Chlorine SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC55103.2022.9856746 DO https://doi.org/10.1109/CSTIC55103.2022.9856746 SF ELIB - SuUB Bremen
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