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Hard mask etch process development for patterning 60nm magn..:

, In: 2022 China Semiconductor Technology International Conference (CSTIC),
Li, Xiaohui ; Liu, Hailong ; Zhu, Ruiping... - p. 1-3 , 2022
Link: https://doi.org/10.1109/CSTIC55103.2022.9856776