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1 Ergebnisse
1
Hard mask etch process development for patterning 60nm magn..:
, In:
2022 China Semiconductor Technology International Conference (CSTIC)
,
Li, Xiaohui
;
Liu, Hailong
;
Zhu, Ruiping
... - p. 1-3 , 2022
Link:
https://doi.org/10.1109/CSTIC55103.2022.9856776
RT T1
2022 China Semiconductor Technology International Conference (CSTIC)
: T1
Hard mask etch process development for patterning 60nm magnetic tunnel junction
UL https://suche.suub.uni-bremen.de/peid=ieee-9856776&Exemplar=1&LAN=DE A1 Li, Xiaohui A1 Liu, Hailong A1 Zhu, Ruiping A1 Liu, Jipeng A1 He, Zhongyi A1 Zhou, Qingjun YR 2022 K1 Strips K1 Nonvolatile memory K1 Magnetic cores K1 Curing K1 Etching K1 Plasmas K1 Surface topography K1 MRAM K1 ICP etching K1 precise topography transfer K1 by-product processing K1 carbon hard mask K1 TaN K1 NMC612M SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC55103.2022.9856776 DO https://doi.org/10.1109/CSTIC55103.2022.9856776 SF ELIB - SuUB Bremen
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