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1 Ergebnisse
1
Effects of Stacked Al2O3 / HFO2 Films Deposited in Deep Tre..:
, In:
2022 China Semiconductor Technology International Conference (CSTIC)
,
Wu, Qixin
;
Liu, Hebao
;
Jin, Haitao
... - p. 1-3 , 2022
Link:
https://doi.org/10.1109/CSTIC55103.2022.9856838
RT T1
2022 China Semiconductor Technology International Conference (CSTIC)
: T1
Effects of Stacked Al2O3 / HFO2 Films Deposited in Deep Trench Isolation on White Pixels Noise
UL https://suche.suub.uni-bremen.de/peid=ieee-9856838&Exemplar=1&LAN=DE A1 Wu, Qixin A1 Liu, Hebao A1 Jin, Haitao A1 Li, Felix A1 Yin, Enjoy A1 Ma, Horse A1 Zheng, Xinhe YR 2022 K1 Films K1 CMOS image sensors K1 Hafnium compounds K1 High-k dielectric materials K1 Leakage currents K1 Aluminum oxide K1 Diffusion tensor imaging SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC55103.2022.9856838 DO https://doi.org/10.1109/CSTIC55103.2022.9856838 SF ELIB - SuUB Bremen
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