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1 Ergebnisse
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Dependence of SiO2 Gate Leakage Current on Annealing Temper..:
, In:
2022 IEEE International Conference on Consumer Electronics - Taiwan
,
Jhang, Wun-Ciang
;
Chen, Pin-Han
;
Hsu, Chih-Chieh
- p. 569-570 , 2022
Link:
https://doi.org/10.1109/ICCE-Taiwan55306.2022.9869260
RT T1
2022 IEEE International Conference on Consumer Electronics - Taiwan
: T1
Dependence of SiO2 Gate Leakage Current on Annealing Temperature of Solution Processed Tin Oxide Semiconductor
UL https://suche.suub.uni-bremen.de/peid=ieee-9869260&Exemplar=1&LAN=DE A1 Jhang, Wun-Ciang A1 Chen, Pin-Han A1 Hsu, Chih-Chieh YR 2022 SN 2575-8284 K1 Silicon compounds K1 Annealing K1 Switches K1 Logic gates K1 Tin K1 Ions K1 Oxidation K1 Sol-gel K1 Tin oxide K1 Semiconductor K1 SiO2 SP 569 OP 570 LK http://dx.doi.org/https://doi.org/10.1109/ICCE-Taiwan55306.2022.9869260 DO https://doi.org/10.1109/ICCE-Taiwan55306.2022.9869260 SF ELIB - SuUB Bremen
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