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Characterization of TiO2 deposited by ALD for SiC MOS capac..:

, In: 2022 36th Symposium on Microelectronics Technology (SBMICRO),
Cesar, R. R. ; Beraldo, R. M. ; Joanni, E.... - p. 1-4 , 2022
Link: https://doi.org/10.1109/SBMICRO55822.2022.9881040