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1 Ergebnisse
1
EUV Minimum Pitch Single Patterning for 5nm Node Manufactur..:
, In:
2022 IEEE International Interconnect Technology Conference (IITC)
,
Park, Jungil
;
Choi, Yunki
;
Ahn, Jeong Hoon
... - p. 133-135 , 2022
Link:
https://doi.org/10.1109/IITC52079.2022.9881283
RT T1 <cTitle>2022 IEEE International Interconnect Technology Conference (IITC)</cTitle>: T1 <Title>EUV Minimum Pitch Single Patterning for 5nm Node Manufacturing</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9881283&Exemplar=1&LAN=DE A1 Park, Jungil A1 Choi, Yunki A1 Ahn, Jeong Hoon A1 Jung, Byung Je A1 Lee, Hoyoun A1 Kim, Jinho A1 Park, Eunyoung A1 Park, Jaehyeong A1 Song, Hyun-Ji A1 Lee, Miji A1 Ku, Ja-Hum YR 2022 SN 2380-6338 K1 Printing K1 Integrated optics K1 Extreme ultraviolet lithography K1 Ultraviolet sources K1 Lighting K1 Adaptive optics K1 Manufacturing K1 Interconnect K1 BEOL K1 EUV K1 OPC K1 Stochastic printing failure K1 single-line-open K1 micro-bridge SP 133 OP 135 LK http://dx.doi.org/https://doi.org/10.1109/IITC52079.2022.9881283 DO https://doi.org/10.1109/IITC52079.2022.9881283 SF ELIB - SuUB Bremen
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