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Integration of Al2O3 Etch Stop Layer in 21nm Pitch Dual-Dam..:

, In: 2022 IEEE International Interconnect Technology Conference (IITC),
Wu, C. ; Vega-Gonzalez, V. ; De Coster, H.... - p. 79-81 , 2022
Link: https://doi.org/10.1109/IITC52079.2022.9881289