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Dual Damascene 28nm-Pitch Single Exposure EUV Design Rules ..:

, In: 2022 IEEE International Interconnect Technology Conference (IITC),
Carballo, V.M. Blanco ; Cerbu, D. ; Schleicher, F.... - p. 142-144 , 2022
Link: https://doi.org/10.1109/IITC52079.2022.9881323