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1 Ergebnisse
1
A Vertical Channel Ferroelectric/Anti-Ferroelectric FET wit..:
, In:
2022 IEEE Silicon Nanoelectronics Workshop (SNW)
,
Li, Zhuo
;
Wu, Jixuan
;
Mei, Xiaoran
... - p. 1-2 , 2022
Link:
https://doi.org/10.1109/SNW56633.2022.9889037
RT T1 <cTitle>2022 IEEE Silicon Nanoelectronics Workshop (SNW)</cTitle>: T1 <Title>A Vertical Channel Ferroelectric/Anti-Ferroelectric FET with ALD InOx and Field-Induced Polar-Axis Alignment for 3D High-Density Memory</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9889037&Exemplar=1&LAN=DE A1 Li, Zhuo A1 Wu, Jixuan A1 Mei, Xiaoran A1 Huang, Xingyu A1 Saraya, Takuya A1 Hiramoto, Toshiro A1 Takahashi, Takanori A1 Uenuma, Mutsunori A1 Uraoka, Yukiharu A1 Kobayashi, Masaharu YR 2022 SN 2161-4644 K1 Semiconductor device measurement K1 Three-dimensional displays K1 Capacitors K1 Switches K1 Tin K1 Logic gates K1 Silicon SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/SNW56633.2022.9889037 DO https://doi.org/10.1109/SNW56633.2022.9889037 SF ELIB - SuUB Bremen
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