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1 Ergebnisse
1
Suppressing Interfacial Layer Degradation in $\text{Hf}_{0...:
, In:
2022 IEEE Silicon Nanoelectronics Workshop (SNW)
,
Zhao, Guoqing
;
Wei, Wei
;
Tai, Lu
... - p. 1-2 , 2022
Link:
https://doi.org/10.1109/SNW56633.2022.9889043
RT T1 <cTitle>2022 IEEE Silicon Nanoelectronics Workshop (SNW)</cTitle>: T1 <Title>Suppressing Interfacial Layer Degradation in $\text{Hf}_{0.5}\text{Zr}_{0.5}\mathrm{O}_{2}$-based FeFETs Using a Pre-erase Strategy during Program/Erase Cycling</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9889043&Exemplar=1&LAN=DE A1 Zhao, Guoqing A1 Wei, Wei A1 Tai, Lu A1 Tang, Mingfeng A1 Li, Xiaopeng A1 Xu, Hao A1 Chai, Junshuai A1 Wang, Xiaolei A1 Wu, Jixuan A1 Zhan, Xuepeng A1 Chen, Jiezhi YR 2022 SN 2161-4644 K1 Degradation K1 Low voltage K1 Conferences K1 Silicon K1 FeFETs K1 Nanoelectronics K1 FeFET K1 Endurance K1 Interfacial layer SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/SNW56633.2022.9889043 DO https://doi.org/10.1109/SNW56633.2022.9889043 SF ELIB - SuUB Bremen
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