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1 Ergebnisse
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MOCVD Epitaxy of α-(AlxGa1−x)2O3 (x =0–100%) on m-Plane Sap..:
, In:
2022 Compound Semiconductor Week (CSW)
,
Bhuiyan, A F M Anhar Uddin
;
Feng, Zixuan
;
Huang, Hsien-Lien
... - p. 1-2 , 2022
Link:
https://doi.org/10.1109/CSW55288.2022.9930429
RT T1
2022 Compound Semiconductor Week (CSW)
: T1
MOCVD Epitaxy of α-(AlxGa1−x)2O3 (x =0–100%) on m-Plane Sapphire Substrate
UL https://suche.suub.uni-bremen.de/peid=ieee-9930429&Exemplar=1&LAN=DE A1 Bhuiyan, A F M Anhar Uddin A1 Feng, Zixuan A1 Huang, Hsien-Lien A1 Meng, Lingyu A1 Hwang, Jinwoo A1 Zhao, Hongping YR 2022 K1 Atomic measurements K1 Semiconductor device measurement K1 X-ray scattering K1 Photonic band gap K1 Raman scattering K1 Surface morphology K1 Superlattices K1 α-(AlxGa1−x)2O3thin film K1 m-plane sapphire substrates K1 MOCVD SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/CSW55288.2022.9930429 DO https://doi.org/10.1109/CSW55288.2022.9930429 SF ELIB - SuUB Bremen
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