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1 Ergebnisse
1
Substrate influence on V2O5growth by spray pyrolisis method:
, In:
2022 International Semiconductor Conference (CAS)
,
Draghiciu, L.
;
Tudose, I.V.
;
Romanitan, C.
... - p. 235-238 , 2022
Link:
https://doi.org/10.1109/CAS56377.2022.9934671
RT T1
2022 International Semiconductor Conference (CAS)
: T1
Substrate influence on V2O5growth by spray pyrolisis method
UL https://suche.suub.uni-bremen.de/peid=ieee-9934671&Exemplar=1&LAN=DE A1 Draghiciu, L. A1 Tudose, I.V. A1 Romanitan, C. A1 Gavrila, R. A1 Brincoveanu, O.A. A1 Comanescu, F.C. A1 Pachiu, C. A1 Muller, R. A1 Dinescu, A. A1 Koudoumas, E. A1 Suchea, M.P. YR 2022 SN 2377-0678 K1 X-ray scattering K1 Annealing K1 Indium tin oxide K1 Raman scattering K1 Surface morphology K1 Glass K1 Vanadium K1 V205 K1 spray pyrolisis method K1 thin films K1 substrate effect SP 235 OP 238 LK http://dx.doi.org/https://doi.org/10.1109/CAS56377.2022.9934671 DO https://doi.org/10.1109/CAS56377.2022.9934671 SF ELIB - SuUB Bremen
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