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1 Ergebnisse
1
Surface engineering for SiC etching with Ni electroplating ..:
, In:
2022 International Semiconductor Conference (CAS)
,
Beydoun, Nour
;
Lazar, Mihai
;
Gassmann, Xavier
- p. 119-122 , 2022
Link:
https://doi.org/10.1109/CAS56377.2022.9934701
RT T1
2022 International Semiconductor Conference (CAS)
: T1
Surface engineering for SiC etching with Ni electroplating masks
UL https://suche.suub.uni-bremen.de/peid=ieee-9934701&Exemplar=1&LAN=DE A1 Beydoun, Nour A1 Lazar, Mihai A1 Gassmann, Xavier YR 2022 SN 2377-0678 K1 Electrochemical deposition K1 Semiconductor device measurement K1 Silicon carbide K1 Surface engineering K1 Plasma measurements K1 Nickel K1 Etching K1 SiC K1 APTES K1 etching K1 Ni electroplating SP 119 OP 122 LK http://dx.doi.org/https://doi.org/10.1109/CAS56377.2022.9934701 DO https://doi.org/10.1109/CAS56377.2022.9934701 SF ELIB - SuUB Bremen
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