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1 Ergebnisse
1
Atomic-layer deposition for development of advanced electro..:
, In:
2022 IEEE International Conference on Engineering Veracruz (ICEV)
,
Molina-Reyes, Joel
- p. 1-4 , 2022
Link:
https://doi.org/10.1109/ICEV56253.2022.9959116
RT T1
2022 IEEE International Conference on Engineering Veracruz (ICEV)
: T1
Atomic-layer deposition for development of advanced electron devices
UL https://suche.suub.uni-bremen.de/peid=ieee-9959116&Exemplar=1&LAN=DE A1 Molina-Reyes, Joel YR 2022 K1 Dielectric constant K1 Atomic layer deposition K1 Memory management K1 Metals K1 Hafnium oxide K1 Sensors K1 Electron devices K1 ALD K1 ultra-thin metal oxide K1 high-dielectric constant K1 CMOS K1 SB-MOSFET K1 ReRAM K1 ISFET K1 quantum devices SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ICEV56253.2022.9959116 DO https://doi.org/10.1109/ICEV56253.2022.9959116 SF ELIB - SuUB Bremen
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