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1 Ergebnisse
1
Uniformity of device performance improvement for the SOT-MR..:
, In:
2022 International Workshop on Advanced Patterning Solutions (IWAPS)
,
Man, Bowen
;
Yang, Xiaowei
;
Zhao, Qingsong
... - p. 1-3 , 2022
Link:
https://doi.org/10.1109/IWAPS57146.2022.9972248
RT T1 <cTitle>2022 International Workshop on Advanced Patterning Solutions (IWAPS)</cTitle>: T1 <Title>Uniformity of device performance improvement for the SOT-MRAM by optimizing the lithography process at 200-mm-wafer manufacturing platform</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9972248&Exemplar=1&LAN=DE A1 Man, Bowen A1 Yang, Xiaowei A1 Zhao, Qingsong A1 Zhang, Cong A1 Lv, Shuqin A1 Lu, Shiyang A1 Cao, Kaihua A1 Liu, Hongxi A1 Wang, Gefei YR 2022 K1 Resistance K1 Performance evaluation K1 Integrated circuits K1 Torque K1 Power demand K1 Lithography K1 Random access memory K1 SOT-MRAM K1 MTJ K1 Multi-energies exposure compensation K1 Uniformity SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/IWAPS57146.2022.9972248 DO https://doi.org/10.1109/IWAPS57146.2022.9972248 SF ELIB - SuUB Bremen
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