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1 Ergebnisse
1
DRAM World-line Bottom Roughness Detection Using BSE Signal:
, In:
2022 International Workshop on Advanced Patterning Solutions (IWAPS)
,
Liu, Linghai
;
Luo, Laura
;
Park, Peter
... - p. 1-4 , 2022
Link:
https://doi.org/10.1109/IWAPS57146.2022.9972302
RT T1
2022 International Workshop on Advanced Patterning Solutions (IWAPS)
: T1
DRAM World-line Bottom Roughness Detection Using BSE Signal
UL https://suche.suub.uni-bremen.de/peid=ieee-9972302&Exemplar=1&LAN=DE A1 Liu, Linghai A1 Luo, Laura A1 Park, Peter A1 Zhang, Al A1 Zhuang, Musa A1 Hu, Jerome A1 Wu, Vincent A1 Zhang, Xiang YR 2022 K1 Semiconductor device measurement K1 Scanning electron microscopy K1 Sensitivity K1 Random access memory K1 Process control K1 Surface roughness K1 Surface topography K1 CDSEM K1 BSE K1 Word Line K1 Roughness SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/IWAPS57146.2022.9972302 DO https://doi.org/10.1109/IWAPS57146.2022.9972302 SF ELIB - SuUB Bremen
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