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1 Ergebnisse
1
Control Strategy for Improved After-Etch Overlay at Wafer E..:
, In:
2022 International Workshop on Advanced Patterning Solutions (IWAPS)
,
Zhang, Junjun
;
Chang, Jimmy
;
Huang, Charlie
... - p. 1-4 , 2022
Link:
https://doi.org/10.1109/IWAPS57146.2022.9972326
RT T1 <cTitle>2022 International Workshop on Advanced Patterning Solutions (IWAPS)</cTitle>: T1 <Title>Control Strategy for Improved After-Etch Overlay at Wafer Edge of DRAM Layers in High-Volume Manufacturing</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9972326&Exemplar=1&LAN=DE A1 Zhang, Junjun A1 Chang, Jimmy A1 Huang, Charlie A1 Zhang, Wei A1 Sun, Helei A1 Zhou, Xiaofang A1 Wang, Bing A1 Huang, Fan A1 Jing, Hao A1 Jiang, Justin A1 Reeuwijk, Matthijs van A1 Vidojkovic, Maja A1 Li, Hua YR 2022 K1 Semiconductor device modeling K1 Conferences K1 Random access memory K1 Process control K1 Resists K1 Quality control K1 Metrology K1 On-Product Overlay K1 run-to-run control K1 after etch K1 wafer edge improvement K1 CPE SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/IWAPS57146.2022.9972326 DO https://doi.org/10.1109/IWAPS57146.2022.9972326 SF ELIB - SuUB Bremen
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