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1 Ergebnisse
1
Curvilinear OPC Application On 180nm Silicon Photonics Layo..:
, In:
2022 International Workshop on Advanced Patterning Solutions (IWAPS)
,
Wu, Qing
;
Li, Zhifeng
;
Zhu, Cynthia
... - p. 1-3 , 2022
Link:
https://doi.org/10.1109/IWAPS57146.2022.9972328
RT T1 <cTitle>2022 International Workshop on Advanced Patterning Solutions (IWAPS)</cTitle>: T1 <Title>Curvilinear OPC Application On 180nm Silicon Photonics Layout For Better Performance</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9972328&Exemplar=1&LAN=DE A1 Wu, Qing A1 Li, Zhifeng A1 Zhu, Cynthia A1 Peng, Lulu A1 Jin, Yadong A1 Shao, Feng A1 Lippincott, George A1 Liubich, Vlad A1 Cao, Guowei A1 Sandhu, Avneet YR 2022 K1 Performance evaluation K1 Semiconductor device modeling K1 Runtime K1 Conferences K1 Computational modeling K1 Layout K1 Lithography K1 Calibre nmCLOPC K1 Silicon photonics K1 Full-chip K1 Inverse lithography technology K1 pxOPC SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/IWAPS57146.2022.9972328 DO https://doi.org/10.1109/IWAPS57146.2022.9972328 SF ELIB - SuUB Bremen
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