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1 Ergebnisse
1
Characterization of mask CD mean-to-target for hotspot patt..:
, In:
2022 International Workshop on Advanced Patterning Solutions (IWAPS)
,
Zhou, Kan
;
Zhao, Hongwen
;
Zhou, Wenzhan
... - p. 1-5 , 2022
Link:
https://doi.org/10.1109/IWAPS57146.2022.9972334
RT T1 <cTitle>2022 International Workshop on Advanced Patterning Solutions (IWAPS)</cTitle>: T1 <Title>Characterization of mask CD mean-to-target for hotspot patterns by using SEM image contours and feed forward intra CDU by mask MTT</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-9972334&Exemplar=1&LAN=DE A1 Zhou, Kan A1 Zhao, Hongwen A1 Zhou, Wenzhan A1 Zhang, Yu A1 Chen, Ao A1 Wu, Wenming A1 Wan, Qijian A1 Dou, Huaiyang A1 Du, Chunshan A1 Zhang, Liguo A1 Fenger, Germain YR 2022 K1 Histograms K1 Image color analysis K1 Semiconductor device reliability K1 Quality control K1 Optical variables measurement K1 Metrology K1 Optical imaging K1 mask CD K1 mean-to-target (MTT) K1 contour extraction K1 contour analysis K1 Optical Proximity Correction (OPC) SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/IWAPS57146.2022.9972334 DO https://doi.org/10.1109/IWAPS57146.2022.9972334 SF ELIB - SuUB Bremen
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