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Achieving Uniformity in a Semiconductor Fabrication Process..:
Hughes-Oliver, Jacqueline M.
;
Lu, Jye-Chyi
;
Davis, Joseph C.
.
Journal of the American Statistical Association. 93 (1998) 441 - p. 36-45 , 1998
Link:
https://www.jstor.org/stable/2669600
RT Journal T1
Achieving Uniformity in a Semiconductor Fabrication Process Using Spatial Modeling
UL https://suche.suub.uni-bremen.de/peid=jstor-2669600&Exemplar=1&LAN=DE A1 Hughes-Oliver, Jacqueline M. A1 Lu, Jye-Chyi A1 Davis, Joseph C. A1 Gyurcsik, Ronald S. PB American Statistical Association YR 1998 SN 0162-1459 K1 Nonstationary Correlation K1 Optimality Criteria K1 Repeatability K1 Restricted Maximum Likelihood K1 Spatial Correlation K1 Variance Modeling K1 Philosophy K1 Metaphysics K1 Ontology K1 Ontological properties K1 Determinable properties K1 Sameness K1 Uniformity K1 Mathematics K1 Applied mathematics K1 Statistics K1 Applied statistics K1 Statistical results K1 Statistical properties K1 Statistical discrepancies K1 Descriptive statistics K1 Correlations K1 Applied sciences K1 Engineering K1 Electrical engineering K1 Electronic components K1 Active components K1 Semiconductors K1 Semiconductor wafers K1 Research methods K1 Modeling K1 Statistical distributions K1 Normal distribution curve K1 Standard deviation K1 Physical sciences K1 Chemistry K1 Chemical compounds K1 Chalcogenides K1 Oxides K1 Information science K1 Information analysis K1 Data analysis K1 Spatial models K1 Statistical models K1 Parametric models JF Journal of the American Statistical Association VO 93 IS 441 SP 36 OP 45 LK http://dx.doi.org/https://www.jstor.org/stable/2669600 DO https://www.jstor.org/stable/2669600 SF ELIB - SuUB Bremen
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