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1 Ergebnisse
1
Demonstration of Ultra-thin Ferroelectric/dielectric and An..:
, In:
2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
,
Suh, Dong Ik
;
Koo, Won-Tae
;
Kim, Youngmo
... - p. 1-3 , 2023
Link:
https://doi.org/10.1109/EDTM55494.2023.10102993
RT T1
2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
: T1
Demonstration of Ultra-thin Ferroelectric/dielectric and Anti-ferroelectric/dielectric Bilayers for Future DRAM Cell Capacitors
UL https://suche.suub.uni-bremen.de/peid=ieee-10102993&Exemplar=1&LAN=DE A1 Suh, Dong Ik A1 Koo, Won-Tae A1 Kim, Youngmo A1 Kim, Ja-Yong A1 Ryu, Seung Wook A1 Jeon, Heeyoung A1 Im, Ki Vin A1 Lee, Gwangyeob A1 Youn, Taeone A1 Jeong, Hyeonho A1 Lee, Seho A1 Na, Myung-Hee A1 Cha, Seon Yong YR 2023 K1 Capacitors K1 Random access memory K1 Capacitance K1 Manufacturing K1 Dielectrics K1 Ferroelectric K1 Anti-ferroelectric K1 DRAM SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/EDTM55494.2023.10102993 DO https://doi.org/10.1109/EDTM55494.2023.10102993 SF ELIB - SuUB Bremen
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